​​Customized High-Purity Quartz Glass Plates JGS1/JGS2/JGS3 High Transmittance​​

​​Customized High-Purity Quartz Glass Plates JGS1/JGS2/JGS3 High Transmittance​​

Fused Silica is an amorphous material formed by melting high-purity silicon dioxide at high temperatures followed by rapid cooling. It exhibits excellent optical properties, thermal stability, and chemical inertness. Based on purity levels and ultraviolet transmittance, it is classified into three grades: JGS1, JGS2, and JGS3.

Classification by Optical Performance:

1. JGS1 (Far-Ultraviolet Optical Fused Silica)

• Produced using SiCl₄ as raw material, melted in a high-purity hydrogen-oxygen flame. Contains high hydroxyl content (≈2000 ppm) and demonstrates exceptional ultraviolet transmittance, particularly in the short-wave UV region. Transmittance exceeds 90% at 185 nm. Synthetic fused silica exhibits a strong absorption peak at 2730 nm with no granular structure. It is an ideal optical material for the 185–2500 nm range.

2. JGS2 (Ultraviolet Optical Fused Silica)

• Manufactured from crystalline raw material via gas refining. Contains tens of ppm metal impurities. Features an absorption peak at 2730 nm (hydroxyl content: 100–200 ppm) with striations and granular structure. It is a suitable material for the 220–2500 nm wavelength range.

3. JGS3 (Infrared Optical Fused Silica)

• Produced from crystalline or high-purity quartz sand raw materials using a vacuum pressure furnace (electrical melting method). Contains tens of ppm metal impurities. Characterized by minimal bubbles, fine granular structure, striations, and negligible OH content. Offers high infrared transmittance (>85%). Applicable as an optical material for the 260–3500 nm range.

Quartz Glass JGS1/JGS2/JGS3 Main Application Fields

1. High-End Optical Systems

• JGS1: Lenses for DUV lithography machines, space telescope mirrors, UV laser collimating components.
• JGS2: Consumer optical devices such as camera lenses, projector prisms, microscope objectives.
• JGS3: Windows for infrared thermal imagers, focusing mirrors for CO₂ lasers.

2. Semiconductor Manufacturing

• Photomask Substrates: JGS1 is a core material for EUV lithography photomask substrates due to its ultra-low coefficient of thermal expansion (5.5×10⁻⁷/℃) and high UV transmittance.
• Wafer Processing Carriers: JGS2 is used for high-temperature承载 components such as semiconductor diffusion furnace tubes and boat holders.

3. Laser Technology

• High-Energy Laser Systems: JGS1 is used for manufacturing resonator mirrors for Nd:YAG lasers (laser-induced damage threshold: 15 J/cm²).
• Infrared Laser Transmission: JGS3 is suitable for CO₂ laser transmission cables at 10.6 μm wavelength.

4. Aerospace

• Spacecraft Windows: JGS1 is used for radiation-resistant windows in satellite optical remote sensors (withstands space radiation).
• Missile Domes: JGS3 is applied in hypersonic vehicle infrared seeker heads due to its excellent thermal shock resistance (ΔT > 1000°C).

5. Special Lighting

• UV Lamps: High-purity UV lamps made from JGS1 are used for water treatment and medical sterilization.
• Mercury Lamp Housings: JGS2 is used for manufacturing transparent housings for high-pressure mercury lamps, resistant to high-temperature shock.

5. Scientific Research Equipment

• Synchrotron Radiation Facilities: JGS1 is used for beamline windows and monochromator components.
• Particle Detectors: JGS2 serves as a transparent medium for Cherenkov radiators.

Quartz Glass JGS1/JGS2/JGS3 Processing Characteristics

• Precision Annealing: Multi-stage gradient annealing (up to 1300°C) eliminates internal stress and prevents optical distortion.
• Surface Treatment: Magnetorheological polishing (MRF) achieves surface roughness of Ra < 0.5 nm (suitable for EUV lithography).
• Coating Technology: Applicable coatings include anti-reflection (AR), high-reflection (HR), and corrosion-resistant coatings (e.g., magnesium fluoride).

Quartz Glass JGS1/JGS2/JGS3 Optical Properties

Quartz Glass JGS1/JGS2/JGS3 Standard Specifications

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Q1: What are the key differences between JGS1, JGS2, and JGS3 fused silica?
A1: JGS1 offers >90% UV transmission (185nm) with 2000ppm OH content, JGS2 provides 220-2500nm transmission with 200ppm OH, while JGS3 delivers >85% IR transmission with near-zero OH content.

Q2: Which fused silica grade is best for UV laser applications?
A2: JGS1 is ideal for UV lasers due to its 90%+ transmittance at 185nm and 15J/cm² laser damage threshold.

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