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SHANGHAI FAMOUS TRADE CO.,LTD

  • China,Shanghai ,Shanghai
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China 6inch-12inch SiC Substrate Laser Separation System Machine Wafers Customized
China 6inch-12inch SiC Substrate Laser Separation System Machine Wafers Customized

  1. China 6inch-12inch SiC Substrate Laser Separation System Machine Wafers Customized
  2. China 6inch-12inch SiC Substrate Laser Separation System Machine Wafers Customized
  3. China 6inch-12inch SiC Substrate Laser Separation System Machine Wafers Customized
  4. China 6inch-12inch SiC Substrate Laser Separation System Machine Wafers Customized

6inch-12inch SiC Substrate Laser Separation System Machine Wafers Customized

  1. MOQ: 5
  2. Price: By case
  3. Get Latest Price
Payment Terms T/T
Supply Ability 1000pcs per month
Delivery Time 3-6 months
​Laser Type​​ Excimer (193nm/248nm), Femtosecond (343nm/1030nm)
​​Processing Area​​ Max 150mm × 150mm
Processing Speed​​ 50–300mm/s
​​Lift-Off Thickness​​ 10nm–20μm
System Integration​​ EFU clean unit, exhaust gas treatment system
Application ​​Semiconductor Manufacturing,​​​​Flexible Electronics​​
Brand Name ZMSH
Model Number Laser Separation System Machine
Certification rohs
Place of Origin CHINA

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  1. Product Details
  2. Company Details

Product Specification

Payment Terms T/T Supply Ability 1000pcs per month
Delivery Time 3-6 months ​Laser Type​​ Excimer (193nm/248nm), Femtosecond (343nm/1030nm)
​​Processing Area​​ Max 150mm × 150mm Processing Speed​​ 50–300mm/s
​​Lift-Off Thickness​​ 10nm–20μm System Integration​​ EFU clean unit, exhaust gas treatment system
Application ​​Semiconductor Manufacturing,​​​​Flexible Electronics​​ Brand Name ZMSH
Model Number Laser Separation System Machine Certification rohs
Place of Origin CHINA
High Light SiC Substrate Laser Separation MachineCustomized SiC Substrate Laser Separation Machine

 

Laser separation system machine of system overview

 
 

6inch-12inch SiC Substrate Laser Separation System Machine Wafers Customized

 
 
 

The Laser Lift-Off (LLO) System is an advanced precision processing technology that utilizes high-energy pulsed lasers to achieve selective material separation at interfaces. This technology is widely applied in semiconductor manufacturing, flexible electronics, optoelectronic devices, and energy sectors. Its core advantages include ​​non-contact processing​​, ​​high-resolution control​​, and ​​multi-material compatibility​​, making it indispensable for applications such as MicroLED mass transfer, flexible display fabrication, and semiconductor wafer-level packaging.

 

 

​​Company Service Highlights​​:

 

​​Customized Solutions​​: Tailored laser wavelength (193nm–1064nm), power (1W–100W), and automation integration to support R&D and mass production.

​​Process Development​​: Laser parameter optimization, beam shaping design, and validation services (e.g., UV laser LLO for sapphire substrates).

​​Smart Maintenance​​: Integrated remote monitoring and fault diagnosis, ensuring 24/7 operational support with <2-hour response time.

 

 


 

Laser separation system machine of technical parameters​

 

 

Parameter​​ ​​Typical Values​​ ​​Notes​​
​​Laser Type​​ Excimer (193nm/248nm), Femtosecond (343nm/1030nm) Pulse width 5–20ns, peak power >10kW
​​Processing Area​​ Max 150mm × 150mm Multi-station parallel processing
​​Processing Speed​​ 50–300mm/s Adjustable per material and laser power
​​Lift-Off Thickness​​ 10nm–20μm Layer-by-layer delamination capability
​​System Integration​​ EFU clean unit, exhaust gas treatment system ISO 14644 cleanliness compliance

 

 


 

Laser separation system machine of working principle

 

LLO operates through ​​selective ablation​​ at material interfaces:

 

​​Laser Irradiation​​: High-energy pulses (e.g., excimer or femtosecond lasers) focus on the target interface (e.g., sapphire-GaN), inducing photothermal/photochemical reactions.

​​Interface Decomposition​​: Laser energy triggers gasification (e.g., GaN → Ga + N₂), generating plasma and thermal stress for controlled delamination.

​​Material Collection​​: Delaminated microstructures are captured via vacuum suction or fluid dynamics, ensuring contamination-free transfer.

 

 

​​Key Technologies​​:

 

  • ​​Ultrafast Lasers​​: Femtosecond pulses (<100fs) minimize thermal damage (e.g., MicroLED separation).
  • ​​Beam Shaping​​: Linear/rectangular beam profiles enhance efficiency (e.g., flexible PCB batch processing).

 

 


 

System Features​​

 

​​Feature​​ ​​Technical Specifications​​ ​​Applications​​
​​Non-contact Processing​​ Laser energy transmitted via optics, avoiding mechanical stress on fragile materials Flexible OLED, MEMS
​​High Precision​​ Positioning accuracy ±0.02mm, energy density control ±1% MicroLED transfer, sub-μm patterning
​​Multi-material Compatibility​​ Supports UV (CO₂), visible (green), and IR lasers; compatible with metals, ceramics, polymers Semiconductors, medical devices, renewables
​​Intelligent Control​​ Integrated machine vision, AI-driven parameter optimization, automated loading/unloading 30%+ production efficiency improvement

 

 


Laser separation system machine of application fields

 

​​1. Semiconductor Manufacturing​​

 

  • ​​Wafer-Level Packaging​​: Laser debonding for chip-on-wafer separation, enhancing yield.

  • ​​MicroLED/Microdisplay​​: Mass transfer of μm-scale LEDs to glass/PET substrates.

 

 

2. ​​Flexible Electronics​​

 

  • ​​Foldable Displays​​: Delamination of flexible circuits from glass substrates (e.g., Samsung Galaxy Fold).

  • ​​Sensor Fabrication​​: Precision stripping of piezoelectric ceramics for tactile sensors.

 

 

​​3. Medical Devices​​

  • ​​Catheter Processing​​: Laser stripping of insulation layers for biocompatible leads.

  • ​​Implant Manufacturing​​: Titanium alloy coating removal for orthopedic implants.

 

 

4. ​​Renewables​​

 

  • ​​Perovskite Solar Cells​​: Transparent conductive electrode stripping for efficiency optimization.

  • ​​PV Modules​​: Laser scribing to reduce silicon wafer waste by 20%.
 

 


 

Laser separation system machine of FAQ

 

 

1. Q: What is a laser lift-off system?​​

    A: A laser lift-off system is a precision processing tool that uses high-energy pulsed lasers to selectively separate materials at interfaces, enabling applications like MicroLED mass transfer and flexible electronics manufacturing .

 

 

​​2. Q: What industries use LLO systems?​​

    A: LLO systems are critical in ​​semiconductor manufacturing​​ (wafer-level packaging), ​​flexible electronics​​ (foldable displays), ​​medical devices​​ (sensor fabrication), and ​​renewables​​ (solar cells), offering non-contact, high-resolution processing .

 

 

 

Tags: #6-12 Inch, #1064nm, # SiC Substrate Laser Separation System Machine, #Wafers Customized

 

 

 

Company Details

Bronze Gleitlager

,

Bronze Sleeve Bushings

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Graphite Plugged Bushings

 from Quality China Factory
  • Business Type:

    Manufacturer,Agent,Importer,Exporter,Trading Company

  • Year Established:

    2013

  • Total Annual:

    1000000-1500000

  • Ecer Certification:

    Verified Supplier

    SHANGHAI FAMOUS TRADE CO.,LTD. locates in the city of Shanghai, Which is the best city of China, and our factory is founded in Wuxi city in 2014.    We specialize in processing a varity of materials into wafers, substrates and custiomized optical glass parts.components wi...     SHANGHAI FAMOUS TRADE CO.,LTD. locates in the city of Shanghai, Which is the best city of China, and our factory is founded in Wuxi city in 2014.    We specialize in processing a varity of materials into wafers, substrates and custiomized optical glass parts.components wi...

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Get in touch with us

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  • SHANGHAI FAMOUS TRADE CO.,LTD
  • Room.1-1805,No.1079 Dianshanhu Road,Qingpu Area Shanghai city, China /201799
  • https://www.galliumnitridewafer.com/

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