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China factory - Hangzhou Freqcontrol Electronic Technology Ltd.

Hangzhou Freqcontrol Electronic Technology Ltd.

  • China,Hangzhou ,Shanghai
  • Verified Supplier

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China 4 Inch 6 Inch LNOI Wafers For Compact And High-Performance Optical Communication
China 4 Inch 6 Inch LNOI Wafers For Compact And High-Performance Optical Communication

  1. China 4 Inch 6 Inch LNOI Wafers For Compact And High-Performance Optical Communication

4 Inch 6 Inch LNOI Wafers For Compact And High-Performance Optical Communication

  1. MOQ: 10 pcs
  2. Price: $2000/pc
  3. Get Latest Price
Payment Terms T/T
Supply Ability 50000 pcs/Month
Delivery Time 1-4 weeks
Packaging Details Cassette/ Jar package, vaccum sealed
Product LiNbO3 On Insulator
Diameter 4 inch, 6 inch
Top Layer Lithium Niobate
Top Thickness 300~600nm
Insolation SiO2 Thermal Oxide
Insolation Thickness 2000±15nm; 3000±50nm; 4700±100nm
the support layer Si、Fused silica
Application Optical Waveguides and Microwaveguides
Brand Name CQT
Model Number LNOI Wafer
Certification ISO:9001, ISO:14001
Place of Origin China

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  1. Product Details
  2. Company Details

Product Specification

Payment Terms T/T Supply Ability 50000 pcs/Month
Delivery Time 1-4 weeks Packaging Details Cassette/ Jar package, vaccum sealed
Product LiNbO3 On Insulator Diameter 4 inch, 6 inch
Top Layer Lithium Niobate Top Thickness 300~600nm
Insolation SiO2 Thermal Oxide Insolation Thickness 2000±15nm; 3000±50nm; 4700±100nm
the support layer Si、Fused silica Application Optical Waveguides and Microwaveguides
Brand Name CQT Model Number LNOI Wafer
Certification ISO:9001, ISO:14001 Place of Origin China
High Light 6 Inch LNOI WafersHigh Performance Optical Communication LNOI WafersCompact LNOI Wafers

4-Inch 6-Inch LNOI Wafers The Perfect Choice for Compact and High-Performance Optical Communication

 

Revolutionize Photonics with Ultra-Low-Loss LNOI Wafers

Next-Gen Lithium Niobate-on-Insulator (LNOI) Platform
Unlock unprecedented performance in integrated photonics with our cutting-edge LNOI wafers, engineered for ultra-low optical loss  and sub-nanometer surface roughness . Combining stoichiometric LiNbO₃ thin films with thermally oxidized SiO₂ buried layers, our wafers deliver ‌>30x higher nonlinear efficiency‌ than conventional bulk crystals, while enabling CMOS-compatible fabrication.

‌Key Advantages‌
✓ ‌Breakthrough EO Performance‌: Achieve ‌>100 GHz modulation bandwidth‌ with r₃₃ >30 pm/V, ideal for 800G/1.6T coherent transceivers.
✓ ‌Quantum-Ready Precision‌: Custom periodic poling (PPLN) with <5 nm domain error for entangled photon generation.
✓ ‌Power-Hardened Design‌: Withstand >10 MW/cm² optical intensity (Telcordia GR-468 certified).

‌Applications‌
▷ 5G/6G ultra-compact EO modulators
▷ Topological photonic circuits & optical computing
▷ Quantum frequency converters (C/L-band to telecom band)
▷ High-sensitivity LiDAR photodetectors

‌Technical Specifications‌
• Wafer Size: 100/150 mm diameter (2" to 6" customizable)
• LiNbO₃ Layer: X-cut/Z-cut, thickness 300±5 nm (standard)
• Buried Oxide: 1-3 μm SiO₂, breakdown voltage >200 V/μm
• Substrate: High-resistivity Si (>5 kΩ·cm)

LNOI Wafer
Structure LN / SiO2 / Si LTV / PLTV < 1.5 μm ( 5 5 mm2 ) / 95%
Diameter Φ100 ± 0.2 mm Edge Exclution 5 mm
Thickness 500 ± 20 μm Bow Within 50 μm
Primary Flat Length 47.5 ± 2 mm
57.5 ± 2 mm
Edge Trimming 2 ± 0.5 mm
Wafer Beveling R Type Environmental Rohs 2.0
Top LN Layer
Average Thickness 400/600±10 nm Uniformity < 40nm @17 Points
Refraction index no > 2.2800, ne < 2.2100 @ 633 nm Orientation X axis ± 0.3°
Grade Optical Surface Ra < 0.5 nm
Defects >1mm None;
1 mm Within 300 total
Delamination None
Scratch >1cm None;
1cm Within 3
Primary Flat Perpendicular to +Y Axis ± 1°
Isolation SiO2 Layer
Average Thickness 2000nm ± 15nm 3000nm ± 50nm 4700nm ± 100nm Uniformity < ±1% @17 Points
Fab. Method Thermal Oxide Refraction index 1.45-1.47 @ 633 nm
Substrate
Material Si Orientation <100> ± 1°
Primary Flat Orientation <110> ± 1° Resistivity > 10 kΩ·cm
Backside Contamination No visible stain Backside Etch

 

 

 


 

 

 

Company Details

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  • Business Type:

    Manufacturer,Trading Company

  • Year Established:

    1999

  • Total Annual:

    800M-1500M

  • Employee Number:

    10~99

  • Ecer Certification:

    Verified Supplier

Founded in 1999, Hangzhou Freqcontrol Electronic Technology Ltd. is a China leading manufacturer of piezoelectric crystal wafers, substrates, components and single crystal growth. We, known as the "CQT Group" in global market, headquartered in Hangzhou, China, empowered by its manufacturin... Founded in 1999, Hangzhou Freqcontrol Electronic Technology Ltd. is a China leading manufacturer of piezoelectric crystal wafers, substrates, components and single crystal growth. We, known as the "CQT Group" in global market, headquartered in Hangzhou, China, empowered by its manufacturin...

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  • Reach Us
  • Hangzhou Freqcontrol Electronic Technology Ltd.
  • Room 1106, CIBC, No.198 Wuxing Rd, Hangzhou, P.R.China
  • https://www.piezowafer.com/

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