99.99% Purity Sputtering Metal Target With Polished Surface Crystal Structure

Product Description:

< 0.8 Um. This ensures a smooth and uniform surface for the deposition of thin films and coatings. Additionally, our targets have a Purity level of 99.99%, ensuring that the deposited films and coatings have a high level of purity and quality. Our Metal Sputtering Targets are available in a range of thicknesses, from 10 to 600mm. This makes them suitable for a wide range of applications, from small-scale R&D to large-scale industrial production. To ensure that our Metal Sputtering Targets reach our customers in the best possible condition, we use advanced packaging techniques. Each target is carefully packed and sealed to prevent any damage or contamination during shipping. Our Metal Sputtering Targets are compatible with various deposition techniques, including DC and RF sputtering. They are also suitable for use with various equipment, such as an Electrostatic Powder Coating Gun or a Conveyor Metal Detector Machine. In conclusion, our Metal Sputtering Targets are highly precise, reliable, and of the highest quality. They are suitable for a wide range of applications in various industries, including electronics, optics, and aerospace. Contact us today to learn more about our Metal Sputtering Targets and how they can benefit your business.

Features:

• Product Name: Metal Sputtering Target
• Technique: Forged And CNC Machined
• Surface: Polished, Anodizing
• Purity: 99.99%
• Surface Finish: Polished
• Thickness: 10-600mm
• Industrial Metal Detector Conveyor
• Alloy Steel Metal

Technical Parameters:

Parameter	Value
Substrate Compatibility	Customized
Technique	Forged and CNC Machined
Surface Finish	Polished
Target Configuration	Single or Multiple
Material	Metal
Thickness	10-600mm
Target Bonding	Indium
Density	Customized
Purity	99.99%
Forming Process	Hot Isostatic Pressing(HIP)

Applications:

1. Semiconductor Industry: Metal sputtering targets are essential in the semiconductor industry for the deposition of thin films on silicon wafers. These thin films are used to create transistors, capacitors, and other electronic components. The metal sputtering targets are used in physical vapor deposition (PVD) systems to deposit the thin films on the silicon wafers. The targets are usually round in shape, polished to a high surface finish, and have a thickness of 10-600mm.

2. 3D Printing: Metal sputtering targets are also used in 3D printing to produce metal parts. The metal targets are melted using a laser or electron beam to produce 3D printing metal powder. The powder is then used to print metal parts layer by layer. The metal sputtering targets used for 3D printing are usually customized according to the specific metal required for the parts.

3. Automotive Industry: Metal sputtering targets are used in the automotive industry for the deposition of thin films on car windows. The thin films are used to reduce heat and glare from the sun. The metal sputtering targets are used in PVD systems to deposit the thin films on the car windows. The targets are usually round in shape, polished to a high surface finish, and have a thickness of 10-600mm.

4. Hand Held Metal Detector: Metal sputtering targets are used in hand-held metal detectors used for security screening. The targets are used to create a magnetic field that interacts with metal objects. The interaction produces a signal that is detected by the hand-held metal detector. The targets used for hand-held metal detectors are usually round in shape and have a thickness of a few millimeters.

5. Freefall Metal Detector: Metal sputtering targets are also used in freefall metal detectors used in the food industry. The targets are used to create a magnetic field that detects metal contaminants in food products. The targets used for freefall metal detectors are usually round in shape and have a thickness of a few millimeters.

Metal sputtering targets can be configured as single or multiple targets depending on the requirements of the application. The density of the targets can also be customized according to the specific metal required for the application. The targets are usually made of high-purity metals such as gold, silver, platinum, and copper.

Customization:

Support and Services:

Our Metal Sputtering Targets are manufactured with high purity raw materials using advanced processes to ensure consistent quality and performance. We offer a wide variety of target sizes, shapes, and materials to meet your specific requirements.

Our technical support team is available to assist with any questions or issues you may encounter during the installation, operation, or maintenance of our sputtering targets. We also provide comprehensive training for your team to ensure proper handling and usage of our products.

In addition, we offer a range of services to support your sputtering process, including custom target design and fabrication, target bonding, and target recycling. Our team of experts can work with you to develop a customized solution that meets your unique needs and budget.