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China factory - guangdong Jietai Ultrasonic cleaning Equipment Co., Ltd.

guangdong Jietai Ultrasonic cleaning Equipment Co., Ltd.

  • China,Dongguan ,Guangdong
  • Verified Supplier

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China Semiconductor Silicon Wafer Cleaner - 40KHz-80KHz Ultrasonic Alkaline/Acid
China Semiconductor Silicon Wafer Cleaner - 40KHz-80KHz Ultrasonic Alkaline/Acid

  1. China Semiconductor Silicon Wafer Cleaner - 40KHz-80KHz Ultrasonic Alkaline/Acid

Semiconductor Silicon Wafer Cleaner - 40KHz-80KHz Ultrasonic Alkaline/Acid

  1. MOQ: 1
  2. Price: ¥800000
  3. Get Latest Price
Payment Terms T/T
Supply Ability One unit. It will take 30 to 60 days.
Delivery Time 30-60work days
Packaging Details Packaging: Wooden case, wooden frame, stretch film. Dimensions: 12M*2M*2.8M
Type Ultrasonic alkaline washing+Ultrasonic acid washing+Pure water rinsing
Name Semiconductor Cleaning Machine
Model JTM-100504AD
Overall Dimensions 12M*2M*2.8M
Cleaning Frequency 40KHZ/80KHZ
Power 120KW
Cleaning temperature 60℃
Number of Tanks 10
Brand Name Jietai
Model Number JTM-100504AD
Certification CE, FCC, ROHS, etc.
Place of Origin Dongguan, Guangdong

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  1. Product Details
  2. Company Details

Product Specification

Payment Terms T/T Supply Ability One unit. It will take 30 to 60 days.
Delivery Time 30-60work days Packaging Details Packaging: Wooden case, wooden frame, stretch film. Dimensions: 12M*2M*2.8M
Type Ultrasonic alkaline washing+Ultrasonic acid washing+Pure water rinsing Name Semiconductor Cleaning Machine
Model JTM-100504AD Overall Dimensions 12M*2M*2.8M
Cleaning Frequency 40KHZ/80KHZ Power 120KW
Cleaning temperature 60℃ Number of Tanks 10
Brand Name Jietai Model Number JTM-100504AD
Certification CE, FCC, ROHS, etc. Place of Origin Dongguan, Guangdong
Product Introduction: Semiconductor Silicon Wafer Cleaner
A precision-engineered solution for semiconductor manufacturing, this ultrasonic cleaning system integrates multi-stage processes to achieve sub-micron level surface purity on silicon wafers—critical for maintaining device performance in advanced node fabrication (down to 5nm).
Sequential Cleaning Stages:
  • Ultrasonic Alkaline Scrubbing: Employs 40KHz-80KHz ultrasonic cavitation in alkaline bath to decompose organic contaminants, strip photoresist residuals, and dislodge macro-particles (≥1μm) from wafer surfaces and via structures. The frequency-tunable ultrasonic energy ensures uniform cleaning across 4"-12" wafer diameters, including edge exclusion zones.
  • Ultrasonic Acid Etching: Utilizes the same frequency range in acidic media to dissolve inorganic impurities—specifically metal ions (Fe, Cu, Zn) and native oxide layers (SiO₂). Cavitation micro-jets penetrate patterned features to remove embedded sub-100nm contaminants, validated by particle counter readings (≤10 particles/wafer for ≥0.1μm).
  • UPW Rinsing: Final rinse with ultra-pure water (UPW, TOC ≤5ppb) flushes residual chemistries, achieving surface resistivity ≥18.2MΩ·cm—meeting SEMI F20 standards for pre-deposition cleaning.
Process Parameters:
  • Frequency Band: 40KHz-80KHz (multi-frequency operation, selectable via HMI for contamination-specific tuning)
  • Temperature Setpoint: 60℃ (PID-controlled, ±1℃ tolerance) to optimize chemical reaction kinetics without inducing wafer warpage.
  • Material Compatibility: Wetted components in PFA (perfluoroalkoxy) and sapphire to prevent metallic ion leaching, ensuring zero cross-contamination.
Fab Integration Advantages:
  • Compatible with FOUP/SMIF pod loading for automated cassette handling, reducing human intervention
  • Cleanroom-class design (ISO 5) with HEPA-filtered exhaust to maintain Class 1 environment compliance
  • Recipe storage for 50+ cleaning protocols, adaptable to bare wafers, SOI wafers, and epi-wafers
Application: Essential for pre-litho, post-CMP, and post-etch cleaning in logic, memory, and MEMS fabrication lines.
Keywords: Semiconductor wafer ultrasonic cleaner, alkaline-acid sequential cleaning, UPW rinsing, 40-80KHz, 60℃ process, sub-micron decontamination

Company Details

Bronze Gleitlager

,

Bronze Sleeve Bushings

 and 

Graphite Plugged Bushings

 from Quality China Factory
  • Business Type:

    Manufacturer

  • Year Established:

    2005

  • Total Annual:

    4,397,596.73-6,397,596.73

  • Employee Number:

    460~500

  • Ecer Certification:

    Verified Supplier

Jietai Ultrasonic was founded in 2005 and specializes in environmental ultrasonic cleaning equipment, wastewater purification equipment, surface treatment equipment, and supporting systems. As a high-tech enterprise integrating R&D, production, sales, and engineering services, we are committed t... Jietai Ultrasonic was founded in 2005 and specializes in environmental ultrasonic cleaning equipment, wastewater purification equipment, surface treatment equipment, and supporting systems. As a high-tech enterprise integrating R&D, production, sales, and engineering services, we are committed t...

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  • guangdong Jietai Ultrasonic cleaning Equipment Co., Ltd.
  • 2nd Floor, Unit 2, Building 16, No. 7, Science and Technology Avenue, Houjie Town, Dongguan City, Guangdong Province
  • https://www.ultrasoniccleaning-machine.com/

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