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China Pure Chromium Plate Sputtering Targets With High Corrosion Resistance
China Pure Chromium Plate Sputtering Targets With High Corrosion Resistance

  1. China Pure Chromium Plate Sputtering Targets With High Corrosion Resistance
  2. China Pure Chromium Plate Sputtering Targets With High Corrosion Resistance
  3. China Pure Chromium Plate Sputtering Targets With High Corrosion Resistance

Pure Chromium Plate Sputtering Targets With High Corrosion Resistance

  1. MOQ: 1kg
  2. Price: 20~100USD/kg
  3. Get Latest Price
Payment Terms L/C, D/A, D/P, T/T, Western Union
Supply Ability 100000kgs/M
Delivery Time 10~25 work days
Packaging Details Plywood case
Material Chromium, Chrome
Process CIP, HIP Pressing
Size Customized
Application PVD Coating,
Density 7.19g/cm3
Shape Round , Plate , Tube Sputtering target
Grain Size Fine Grain Size, Good density
Purity 99.5%, 99.9%, 99.95%
Brand Name JINXING
Model Number Chromium Plate Sputtering Target
Certification ISO 9001
Place of Origin China

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  1. Product Details
  2. Company Details

Product Specification

Payment Terms L/C, D/A, D/P, T/T, Western Union Supply Ability 100000kgs/M
Delivery Time 10~25 work days Packaging Details Plywood case
Material Chromium, Chrome Process CIP, HIP Pressing
Size Customized Application PVD Coating,
Density 7.19g/cm3 Shape Round , Plate , Tube Sputtering target
Grain Size Fine Grain Size, Good density Purity 99.5%, 99.9%, 99.95%
Brand Name JINXING Model Number Chromium Plate Sputtering Target
Certification ISO 9001 Place of Origin China
High Light Pure Chromium Plate Sputtering TargetsHigh Corrosion Resistance Sputtering Target7.19 g/cm3 Sputtering Target

Chromium Plate Sputtering Target

Chromium plate sputtering target material is silvery white shiny metal, pure chromium has ductility, and chromium containing impurities is hard and brittle. The density is 7.19g/cm3. Soluble in strong alkali solution. Chromium has a high corrosion resistance, and oxidation is slow in the air, even in the state of red heat. Insoluble in water. Protection by plating on metal

 

  • Description

Chromium Sputtering Target, Chromium Target are available in varying sizes 

 

The traditional sintering process of high purity chromium sputtering target prepared by powder metallurgy is analyzed and optimized. The experimental results show that the target density can be effectively guaranteed by processing the sputtering target with "mould pressing + sintering" or "cold isostatic pressing + sintering" and controlling the sintering temperature reasonably.

 

 

Grades: Chrome Sputtering target
  Purity: 99.5%, 99.9%, 99.95%
Chromium Alloy AlCr, CrAl, CrSi, TiCr etc
Density:  7.19g/cm3
Shape: Round Shape , Tube Shape and Plate Shape.

 

Sizes:

 

Plate sputtering targets:

 

Thickness: 0.04 to 1.40" (1.0 to 35mm).

Width up to 20"(50 to 500mm).

Length: 3.9" to 6.56 feet( 100-2000mm)

other sizes as requested.

 

Cylinder sputtering targets:

 

3.94 Dia. x 1.58"(100 Dia. x 40mm)

2.56 Dia. x 1.58" (65 Dia. x 40mm)

or 63*32mm other sizes as requested.

 

Tube sputtering targets:

 

2.76 OD x 0.28 WT x 39.4”L (70 OD x 7 WT x 1000mm L)

3.46 OD x 0.39 WT x 48.4”L (88 OD x 10 WT x 1230mm L)

other sizes as requested.

 

The effect of different processing methods on the sintering density of chromium target. In the process of mechanical pressing, two-way pressing is adopted without any molding agent and deoxidizer. The target density of Cr ring is 78% - 80% by mechanical pressing + vacuum sintering; the target density of Cr plate sputtering target is more than 82% by cold isostatic pressing + vacuum sintering; after rolling, the target density of Cr plate is increased to 90% - 95%; the sputtering target density of Cr alloy is more than 98% by hot pressing. By optimizing the sintering time and temperature, the sintering cost of chromium ring target is greatly reduced.

 

Application:


1. Metal chromium purity 99% - 99.5%: used for alloy additives, cermet, powder metallurgy, hard alloy, diamond tools, diamond products, electrical alloy, flux cored wire, welding materials, aluminum alloy additives, thermal spraying materials, high temperature and high wear-resistant materials, optical coating materials, chemical products, etc.


2. Purity of metal chromium 99.5% - 99.9%: used for physical vapor deposition, high temperature alloy, hot isostatic pressing chromium target raw materials, cermet, hard alloy addition, welding materials, diamond tools, laser cladding, spraying, etc.


3. The purity of metal chromium is more than 99.9%; it is used for aerospace materials, steam turbines, coating targets, etc.

 

Type Application Main alloy Request
Semiconductor Preparation of core materials for integrated circuits W. Tungsten titanium (WTI), Ti, Ta, Al alloy, Cu, etc., with a purity of more than 4N or 5N

 

 

 

Highest technical requirements, ultra-high purity metal, high precision size, high integration

 

Screen Display Sputtering technology ensures uniformity of film production, improves productivity and reduces cost Niobium target, Silicon target, Cr target, molybdenum target, MoNb, Al target, Aluminum alloy target, Copper target, Copper alloy target

 

 

 

High technical requirements, high-purity materials, large material area and high degree of uniformity

 

Decorate It is used for coating on the surface of products to beautify the effect of wear resistance and corrosion resistance

 

 

 

 

Chromium target, titanium target, zirconium (Zr), nickel, tungsten, titanium aluminum, CRSI, CrTi, cralzr, stainless steel target

 

mainly used for decoration, energy saving, etc
Tooling

 

 

 

Strengthen the surface of tools and moulds, improve the service life and the quality of manufactured parts

 

TiAl target, Cr Al target, Cr target, Ti target, tin, tic, Al203, etc High performance requirements and long service life
Solar photovoltaic Sputtered thin film technology for the fabrication of the fourth generation thin film solar cells Zinc aluminum oxide target, zinc oxide target, zinc aluminum target, molybdenum target, cadmium sulfide (CDS) target, copper indium gallium selenium, etc Wide Application
Electronic accessories

 

 

 

 

For film resistance and film capacitance

 

NiCr target, NiCr target, Cr Si target, Ta target, NiCr Al target, etc Small size, good stability and small resistance temperature coefficient are required for electronic devices
Information storage

 

 

 

 

For making magnetic memory

 

Cr based, Co based, CO Fe based, Ni based alloys High storage density, high transmission speed

Company Details

Bronze Gleitlager

,

Bronze Sleeve Bushings

 and 

Graphite Plugged Bushings

 from Quality China Factory
  • Business Type:

    Manufacturer,Distributor/Wholesaler,Importer,Exporter,Seller,Other

  • Year Established:

    2007

  • Total Annual:

    5,000,000-10,000,000

  • Employee Number:

    10~25

  • Ecer Certification:

    Site Member

JINXING MATECH is a research and development, production, processing and sales of integrated, comprehensive refractory metal, precious metal material manufacturer.JINXING MATECH is an expert provider on the metal solution. Especially on the products such as Tungsten , Tungsten copper , Titanium ... JINXING MATECH is a research and development, production, processing and sales of integrated, comprehensive refractory metal, precious metal material manufacturer.JINXING MATECH is an expert provider on the metal solution. Especially on the products such as Tungsten , Tungsten copper , Titanium ...

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  • JINXING MATECH CO LTD
  • NO.57 KEXUEDADAO ROAD
  • https://www.zirconiumbar.com/

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